Presentation
From Process Requirements to Automated Furnace Solutions for 300mm Production Environments
Diffusion and deposition processes in 300 mm semiconductor manufacturing impose strict requirements on reactor design; equipment automation and material handling. High wafer volumes, batch-based processing, and tight process control targets make the reliable, and cost effective integration of furnace systems into automated fab environments a non-trivial task.
This presentation addresses typical automation and integration challenges encountered when transferring diffusion and deposition furnace systems into production. Two real-world implementations are discussed: a fully automated six-reactor horizontal furnace system and an automated two-reactor vertical furnace system, both integrated into modern 300 mm fab environments.
The contribution aims to share practical lessons learned that are relevant for automation engineers, system integrators, and fab planners working on complex equipment integration in semiconductor production.